Integrated Vapor Deposition System

Integrated Vapor Deposition System
Perfect fusion of PVD and CVD, physical sputtering and chemical
vapor deposition work synergistically
From nano-coatings to diamond films, single atomic layer precision
controls deposition process
Langmuir-Blodgett technique evolved here, achieving uniform
deposition on complex 3D surfaces
Ultimate answer to surface engineering
Built-in Parallel Mechanism
Built-in parallel processing, no parallel control hatch required
Max Parallel: Determined by glass tier
Formula: 4^(Glass Tier)
Supports High-Amperage Energy Input
Supports high-power input through Laser Hatches or wireless
energy hatches rated at 256A or higher
Can process multiple recipes at once
Allows the installation of thread hatches to achieve multi-
threaded recipe parallel processing.
Imagine the unimaginable work efficiency, go ahead and do it!
Recipe Type: Chemical Vapor Deposition, Physical Vapor Deposition
Atomic-level coating sanctuary, where materials perform rebirth
dance in gaseous state
Atoms drift like stardust in vacuum chamber, weaving perfect
coatings on substrate surfaces
Type
Items
Mod
GTOCore
ID
gtocore:integrated_vapor_deposition_system
Game version
0.6.0-dev19 (Normal)

Made by

  • Assembly LineMakes Integrated Vapor Deposition SystemView recipe
    UHV
    Duration
    40 s
    Total
    1,677,721,600 EU
    Usage
    2,097,152 EU/t
    Conditions and notes
  • Research StationMakes Integrated Vapor Deposition SystemView recipe
    LuV
    Max Total
    122,880,000 EU
    Usage
    30,720 EU/t
    Min. Computation
    256 CWU/t
    Total Computation
    1,024,000 CWU
  • Block DropsMakes Integrated Vapor Deposition SystemView recipe
Voltage