Integrated Vapor Deposition System

gtocore:integrated_vapor_deposition_system, from GTOCore

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Details Made by (3)Used in (5)Version history

3 recipes make this.

Voltage

Assembly LineMakes Integrated Vapor Deposition SystemView recipe
16 16 32 8 8 16 32 8 32 2.3B 2.3B
UHV
Duration
40 s
Total
1,677,721,600 EU
Usage
2,097,152 EU/t
Conditions and notes
- Researched in Laser Reaction Condition Control
- Requires Research
Research StationMakes Integrated Vapor Deposition SystemView recipe
LuV
Max Total
122,880,000 EU
Usage
30,720 EU/t
Min. Computation
256 CWU/t
Total Computation
1,024,000 CWU
Block DropsMakes Integrated Vapor Deposition SystemView recipe