Lithography Mask
Recipe gtceu:beam_guided_computation_testing/optical_computing_channel in 0.5.6-beta and in 0.6.0-dev19, side by side.
Back to the list
Added
0.5.6-beta
0.5.6-beta has no such recipe.
0.6.0-dev19View recipe
UHV
- Duration
- 120 s
- Total
- 2,577,600,000 EU
- Usage
- 1,074,000 EU/t
Conditions and notes
- Research Points
- Ray Wavelength: 749 nm~751 nm
- Ray Intensity: >6400 a.u.
- Vacuum Tier: 4
- Requires a beam with wavelength 749nm~751nm and intensity above 6400a.u.