Lithography Mask

Lithography Mask
Type
Items
Mod
GTOCore
ID
gtocore:lithography_mask
Game version
0.6.0-dev19 (Normal)

Made by

Voltage
  • DisassemblyTakes apart Grating Lithography MaskView recipe
    EV
    Duration
    10 s
    Total
    384,000 EU
    Usage
    1,920 EU/t
  • Precision Laser EngraverMakes High Precision Crystal SoCView recipe
    UEV
    Duration
    120 s
    Total
    18,874,368,000 EU
    Usage
    7,864,320 EU/t
  • AssemblerMakes Grating Lithography MaskView recipe
    EV
    Duration
    10 s
    Total
    384,000 EU
    Usage
    1,920 EU/t
    Conditions and notes
    • Requires Cleanroom
  • Beam Guided Computation TestingMakes Lithography MaskView recipe
    UHV
    Duration
    120 s
    Total
    2,577,600,000 EU
    Usage
    1,074,000 EU/t
    Conditions and notes
    • Research Points
    • Ray Wavelength: 749 nm~751 nm
    • Ray Intensity: >6400 a.u.
    • Vacuum Tier: 4
    • Requires a beam with wavelength 749nm~751nm and intensity above 6400a.u.