Chemical Vapor Deposition

Every recipe EMI shows in GregTech Odyssey 0.5.6-beta, drawn as in game, with its voltage, time and conditions.

Recipe category

18 recipes.

Thin Ce Ox Poly Dopamine Reinforced Polytetrafluoroethylene SheetChemical Vapor DepositionView recipe
16 1B 1B 10B 16 1BDuration: 60 secsTotal: 384,000,000 EUUsage: 320,000 EU/tUV
Extreme Temperature Interface Stabilized Mfpc DustChemical Vapor DepositionView recipe
1B 100mB 4B Duration: 60 secsTotal: 2,880,000 EUUsage: 2,400 EU/tIV
Graphene FoilChemical Vapor DepositionView recipe
3 1B 8 2BDuration: 6 secsTotal: 921,600 EUUsage: 7,680 EU/tIV
HPIC WaferChemical Vapor DepositionView recipe
2 144mB Requires CleanroomDuration: 60 secsTotal: 9,216,000 EUUsage: 7,680 EU/tIV
High Purity Silicon BouleChemical Vapor DepositionView recipe
32B 64BVacuum Tier: 4Duration: 600 secsTotal: 92,160,000 EUUsage: 7,680 EU/tIV
Silver Coated Hollow Ceramic Microspheres DustChemical Vapor DepositionView recipe
8 500mB 500mB 8 1BDuration: 600 secsTotal: 5,898,240,000 EUUsage: 491,520 EU/tUV
Carbon Nanotube Coated Phase Change Microbeads DustChemical Vapor DepositionView recipe
16 1B 4B 100mB 16Duration: 40 secsTotal: 6,144,000 EUUsage: 7,680 EU/tIV
Nano CPU WaferChemical Vapor DepositionView recipe
16 576mB Requires CleanroomDuration: 60 secsTotal: 2,304,000 EUUsage: 1,920 EU/tEV
Thin Nanocrack Regulated Self Humidifying Composite Material SheetChemical Vapor DepositionView recipe
16 3B 1B 1B 16 1BDuration: 60 secsTotal: 384,000,000 EUUsage: 320,000 EU/tUV
Qubit CPU WaferChemical Vapor DepositionView recipe
2 288mB Requires CleanroomDuration: 45 secsTotal: 1,728,000 EUUsage: 1,920 EU/tEV
Qubit CPU WaferChemical Vapor DepositionView recipe
50mB Requires CleanroomDuration: 60 secsTotal: 2,304,000 EUUsage: 1,920 EU/tEV
Sol Gel Qd Interface Modified Mfpc DustChemical Vapor DepositionView recipe
1B Requires CleanroomDuration: 60 secsTotal: 1,440,000 EUUsage: 1,200 EU/tEV